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Ol 42 24 5070 by legendsupercd is a document available to read on EtoBox.

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The document discusses high-reflection Mo/Be/Si multilayers for extreme ultraviolet (EUV) lithography, highlighting the impact of Be layers on the reflection coefficients. The study shows that optimized multilayers can achieve reflection coefficients above 71% at 13.5 nm and 72% at 12.9 nm, with potential for further improvement through interface engineering. The findings are significant for enhancing the efficiency of EUV lithography systems.

Author
legendsupercd
Language
EN