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Effects of Etch Barrier Densification on Step and Flash Imprint Lithography by Johnson, S.; Burns, R.; Kim, E. K.; Dickey, M.; Schmid, G.; Meiring, J.; Burns, S.; Willson, C. G.; Convey, D.; Wei, Y.; Fejes, P.; Gehoski, K.; Mancini, D.; Nordquist, K.; Dauksher, W. J.; Resnick, D. J. is a Engineering article available to read on EtoBox.

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Author
Johnson, S.; Burns, R.; Kim, E. K.; Dickey, M.; Schmid, G.; Meiring, J.; Burns, S.; Willson, C. G.; Convey, D.; Wei, Y.; Fejes, P.; Gehoski, K.; Mancini, D.; Nordquist, K.; Dauksher, W. J.; Resnick, D. J.
Publisher
AVS (American Vacuum Society); American Vacuum Society; American Institute of Physics (ISSN 0734-211X)
Published
2005
Field
Engineering (Physical Sciences)

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