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About this Engineering article
Summary Abstract: Hydrogen plasma etching of semiconductors and their oxides by Chang, R. P. H. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Chang, R. P. H.
- Publisher
- AVS (American Vacuum Society); American Vacuum Society; American Institute of Physics (ISSN 0022-5355)
- Published
- 1982
- Field
- Engineering (Physical Sciences)