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This technical paper discusses the fabrication of microfluidic channels in silicon wafers using an isotropic wet etching method with a novel masking layer of SiO2 and Cr thin films combined with positive photoresist. The study investigates the impact of varying the composition of a hydrofluoric acid-nitric acid-acetic acid (HNA) solution on etching parameters, revealing that a specific composition (10:20:20) yields the best surface quality. The results demonstrate the potential for improved microfluidic dev

Author

akulaakhilesh3

Language

EN