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Fabrication and characterization of a Mo/Si multilayer monochromator with a narrow spectral bandwidth in the xuv domain by Rabah Benbalagh; Jean-Michel André; Robert Barchewitz; Marie-Françoise Ravet; Alain Raynal; Frank Delmotte; Françoise Bridou; Gwaénäelle Julié; Alain Bosseboeuf; René Laval; Philippe Troussel is a Physics and Astronomy article available to read on EtoBox.
What is Fabrication and characterization of a Mo/Si multilayer monochromator with a narrow spectral bandwidth in the xuv domain about?
A new kind of xuv multilayer monochromator with a narrow spectral bandwidth is introduced. This monochromator is based on a Mo/Si multilayer mirror etched according to the pro"le of a lamellar grating. The fabrication of such a device involving multilayer deposition, UV lithography and reactive ion etching is presented. The monochromator has been characterized by means of the synchrotron radiation around the Si}L edge (100 eV). A reduction of the bandwidth has been observed with respect to the unpatterned mirror by a factor close to 3.
Who reads Fabrication and characterization of a Mo/Si multilayer monochromator with a narrow spectral bandwidth in the xuv domain?
It is typically read by researchers, students, and practitioners in Physics and Astronomy.
- Author
- Rabah Benbalagh; Jean-Michel André; Robert Barchewitz; Marie-Françoise Ravet; Alain Raynal; Frank Delmotte; Françoise Bridou; Gwaénäelle Julié; Alain Bosseboeuf; René Laval; Philippe Troussel
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV; ScienceOpen (ISSN 0168-9002)
- Published
- 2001
- Language
- EN
- Field
- Physics and Astronomy (Physical Sciences)