About this Engineering article
Etching Selectivity and Surface Profile of GaN in the Ni, SiO 2 and Photoresist Masks Using an Inductively Coupled Plasma by Chang, Liann-Be; Liu, Su-Sir; Jeng, Ming-Jer is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Chang, Liann-Be; Liu, Su-Sir; Jeng, Ming-Jer
- Publisher
- Institute of Pure and Applied Physics; Japan Society of Applied Physics; IOP Publishing (ISSN 0021-4922)
- Published
- 2001
- Language
- EN
- Field
- Engineering (Physical Sciences)