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About this Engineering article
Molecular-dynamics Simulation of Low-temperature Growth of Silicon Films by Cluster Deposition by Xie, J Q; Feng, J Y; Lu, H W is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Xie, J Q; Feng, J Y; Lu, H W
- Publisher
- Institute of Physics; IOP Publishing; Institute of Physics Publishing (ISSN 0965-0393)
- Published
- 1999
- Field
- Engineering (Physical Sciences)