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About this Physics and Astronomy article
Plasma chemical vapor deposition of hydrocarbon films: The influence of hydrocarbon source gas on the film properties by Schwarz-Selinger, T.; von Keudell, A.; Jacob, W. is a Physics and Astronomy article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Physics and Astronomy.
- Author
- Schwarz-Selinger, T.; von Keudell, A.; Jacob, W.
- Publisher
- American Institute of Physics; AIP Publishing; Publons (ISSN 0021-8979)
- Published
- 1999
- Field
- Physics and Astronomy (Physical Sciences)
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