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About this Engineering article
Suppression of short channel effects in FinFETs using crystalline ZrO 2 high- K /Al 2 O 3 buffer layer gate stack for low power device applications by Tsai, Meng-Chen; Wang, Chin-I; Chen, Yen-Chang; Chen, Yi-Ju; Li, Kai-Shin; Chen, Min-Cheng; Chen, Miin-Jang is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Tsai, Meng-Chen; Wang, Chin-I; Chen, Yen-Chang; Chen, Yi-Ju; Li, Kai-Shin; Chen, Min-Cheng; Chen, Miin-Jang
- Publisher
- Institute of Physics; IOP Publishing; Institute of Physics Publishing (ISSN 0268-1242)
- Published
- 2018
- Language
- EN
- Field
- Engineering (Physical Sciences)