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About this Engineering article
Relaxation of SiGe Films for the Fabrication of Strained Si Devices by Maa, J.S.; Tweet, D. J.; Lee, J.J.; Hsu, S.T.; Fujii, K.; Naka, T.; Ueda, T.; Baba, T.; Awaya, N.; Sakiyama, K. is a Engineering article available to read on EtoBox.
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- Author
- Maa, J.S.; Tweet, D. J.; Lee, J.J.; Hsu, S.T.; Fujii, K.; Naka, T.; Ueda, T.; Baba, T.; Awaya, N.; Sakiyama, K.
- Publisher
- Cambridge University Press; Cambridge University Press (Materials Research Society); Cambridge University Press (CUP) (ISSN 0272-9172)
- Published
- 2003
- Field
- Engineering (Physical Sciences)