About this scholarly article

2004 IEEE International Reliability Physics Symposium. Proceedings - Drain biased TDDB lifetime model for ultra thin gate oxide by Chin-Yuan Ko, ; Tsai, Y.S.; Liao, P.J.; Wang, J.J.; Oates, A.; Wu, K. is a scholarly article available to read on EtoBox.

Author

Chin-Yuan Ko, ; Tsai, Y.S.; Liao, P.J.; Wang, J.J.; Oates, A.; Wu, K.

Publisher

IEEE

Published

2004

Language

EN