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The study investigates the deposition of titanium nitride (TiN) thin films on glass substrates for low-emission coating applications using atmospheric pressure chemical vapor deposition (APCVD). The TiN films exhibit favorable optical properties, including over 40% reflectivity in the near-infrared band and approximately 60% visible transmittance, alongside a sheet electrical resistance of 34.5 Ω, indicating good energy-saving performance. The findings suggest that TiN films can serve as effective low-e coa

Author

L Q H

Language

EN