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About this Materials Science article
Analysis of high-k HfO2 and HfSiO4 dielectric films by W. Nieveen; B.W. Schueler; G. Goodman; P. Schnabel; J. Moskito; I. Mowat; G. Chao is a Materials Science article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- W. Nieveen; B.W. Schueler; G. Goodman; P. Schnabel; J. Moskito; I. Mowat; G. Chao
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0169-4332)
- Published
- 2004
- Field
- Materials Science (Physical Sciences)