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About this Engineering article
Electron beam lithography for data storage: Quantifying the proximity effect as a function of CAD design and thin metal layers by A. Eckert; K. Mountfield is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- A. Eckert; K. Mountfield
- Publisher
- AVS (American Vacuum Society); American Vacuum Society; American Institute of Physics (ISSN 0734-211X)
- Published
- 2004
- Language
- EN
- Field
- Engineering (Physical Sciences)