Skip to content

Opening book details…

About this Engineering article

Preparation of Bismuth Silicate Films on Si Wafer by Metalorganic Chemical Vapor Deposition by Kim, Jonghee; Tsurumi, Takaaki; Hirano, Hideyuki; Kamiya, Toshio; Mizutani, Nobuyasu; Daimon, Masaki is a Engineering article available to read on EtoBox.

It is typically read by researchers, students, and practitioners in Engineering.

Author
Kim, Jonghee; Tsurumi, Takaaki; Hirano, Hideyuki; Kamiya, Toshio; Mizutani, Nobuyasu; Daimon, Masaki
Publisher
Institute of Pure and Applied Physics; Japan Society of Applied Physics; IOP Publishing (ISSN 0021-4922)
Published
1993
Language
EN
Field
Engineering (Physical Sciences)

More by Kim, Jonghee; Tsurumi, Takaaki; Hirano, Hideyuki; Kamiya, Toshio; Mizutani, Nobuyasu; Daimon, Masaki

Browse all works by Kim, Jonghee; Tsurumi, Takaaki; Hirano, Hideyuki; Kamiya, Toshio; Mizutani, Nobuyasu; Daimon, Masaki