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About this Materials Science article
High-Temperature Active Oxidation and Active-to-Passive Transition of Chemically Vapor-Deposited Silicon Nitride in N2–O2 and Ar–O2 Atmospheres by Takayuki Narushima; Takashi Goto; Yoshio Yokoyama; Jun Hagiwara; Yasutaka Iguchi; Toshio Hirai is a Materials Science article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- Takayuki Narushima; Takashi Goto; Yoshio Yokoyama; Jun Hagiwara; Yasutaka Iguchi; Toshio Hirai
- Publisher
- John Wiley and Sons; Wiley (Blackwell Publishing); Wiley-Blackwell; Wiley (ISSN 0002-7820)
- Published
- 1994
- Language
- EN
- Field
- Materials Science (Physical Sciences)