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About this Engineering article
Improved tunnel magnetoresistance of magnetic tunnel junctions with Heusler Co2FeAl0.5Si0.5 electrodes fabricated by molecular beam epitaxy by Tezuka, N.; Ikeda, N.; Mitsuhashi, F.; Sugimoto, S. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Tezuka, N.; Ikeda, N.; Mitsuhashi, F.; Sugimoto, S.
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 0003-6951)
- Published
- 2009
- Field
- Engineering (Physical Sciences)
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