About this scholarly article

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - Chemically amplified resist modeling in OPC by Zheng, Xin; Levinson, Harry J.; Dusa, Mircea V.; Huang, Jason; Kuo, Fred; Kazarian, Aram; Chin, Fook; Fan, Yongfa is a scholarly article available to read on EtoBox.

Author

Zheng, Xin; Levinson, Harry J.; Dusa, Mircea V.; Huang, Jason; Kuo, Fred; Kazarian, Aram; Chin, Fook; Fan, Yongfa

Publisher

SPIE

Published

2009