About this scholarly article

Extended Abstracts - 2008 8th International Workshop on Junction Technology (IWJT '08) - COO reduction on polysilicon gate doping by beam current increase on batch-type implanters by Hisaki Izutani, ; Yuji Takahashi, ; Mitsuaki Harada, is a scholarly article available to read on EtoBox.

Author

Hisaki Izutani, ; Yuji Takahashi, ; Mitsuaki Harada,

Publisher

IEEE

Published

2008