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UHV Sputtering System Specifications by Dani Marconi is a document available to read on EtoBox.

This document summarizes the components of a sputtering system including a sputtering chamber, pumping system, vacuum gauges, manipulator, magnetrons, effusion cells, electron beam evaporator, quartz balance, gas dosing system, and accessories. The key components are a sputtering chamber equipped for magnetron sputtering, thermal deposition, and e-beam evaporation with various ports, a pumping system including a turbo pump and forepump, two magnetron sources, two effusion cells, an electron beam evaporator,

Author
Dani Marconi
Language
EN