Skip to content

Opening book details…

Can I read First-principles study of thin magnetic transition-metal silicide films on Si on EtoBox?

First-principles study of thin magnetic transition-metal silicide films on Si by Wu, Hua; Kratzer, Peter; Scheffler, Matthias is a scholarly article available to read on EtoBox.

What is First-principles study of thin magnetic transition-metal silicide films on Si about?

In order to combine silicon technology with the functionality of magnetic systems, a number of ferromagnetic (FM) materials have been suggested for the fabrication of metal/semiconductor heterojunctions. In this work, we present a systematic study of several candidate materials in contact with the Si surface. We employ density-functional theory calculations to address the thermodynamic stability and magnetism of both pseudomorphic CsCl-like $M$Si ($M$=Mn, Fe, Co, Ni) thin films and Heusler alloy $M_2$MnSi ($M$=Fe, Co, Ni) films on Si(001). Our calculations show that Si-termination of the $M$Si films is energetically preferable during epitaxy since it minimizes the energetic cost of broken bonds at the surface. Moreover, we can explain the calculated trends in thermodynamic stability of the $M$Si thin films in terms of the $M$-Si bond-strength and the $M$ 3d orbital occupation. From our calculations, we predict that ultrathin MnSi films are FM with sizable spin magnetic moments at the Mn atoms, while FeSi and NiSi films are nonmagnetic. However, CoSi films display itinerant ferromagnetism. For the $M_2$MnSi films with Heusler-type structure, the MnSi termination is found to have the

Author
Wu, Hua; Kratzer, Peter; Scheffler, Matthias
Published
2005
Language
EN

More by Wu, Hua; Kratzer, Peter; Scheffler, Matthias

Browse all works by Wu, Hua; Kratzer, Peter; Scheffler, Matthias