Retardation of Sb Diffusion in Si during Thermal Oxidation

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Published1981

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Published by Institute of Pure and Applied Physics; Japan Society of Applied Physics; IOP Publishing (ISSN 0021-4922) (1981).

Publisher: Institute of Pure and Applied Physics; Japan Society of Applied Physics; IOP Publishing (ISSN 0021-4922)

About this Engineering article

Retardation of Sb Diffusion in Si during Thermal Oxidation by Mizuo, Shoichi; Higuchi, Hisayuki is a Engineering article available to read on EtoBox.

It is typically read by researchers, students, and practitioners in Engineering.

Author

Mizuo, Shoichi; Higuchi, Hisayuki

Publisher

Institute of Pure and Applied Physics; Japan Society of Applied Physics; IOP Publishing (ISSN 0021-4922)

Published

1981

Field

Engineering (Physical Sciences)