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About this Materials Science article
Use of SIMS for determining the segregation coefficient of boron at the SiSiO2interface in steam oxidation following ion implantation by Dao Khac An; F. Pavlyák is a Materials Science article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- Dao Khac An; F. Pavlyák
- Publisher
- John Wiley and Sons; Wiley (John Wiley & Sons); John Wiley & Sons Ltd.; Wiley; Wiley - V C H Verlag GmbbH & Co. (ISSN 0031-8965)
- Published
- 1986
- Language
- EN
- Field
- Materials Science (Physical Sciences)