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The Stress-induced Voids Formation In The Polysilicon Film During Poly-buffered Local Oxidation Of Silicon: Characterisation And Model by Colpani, P (author);Rebora, A (author);Pavia, G (author);Queirolo, G (author);Carrara, A (author);Calegari, C (author);Olivetti, C (author) is a scholarly article available to read on EtoBox.

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Colpani, P (author);Rebora, A (author);Pavia, G (author);Queirolo, G (author);Carrara, A (author);Calegari, C (author);Olivetti, C (author)