About this scholarly article

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology IX - Yokohama, Japan (Tuesday 23 April 2002)] Photomask and Next-Generation Lithography Mask Technology IX - Reticle defect printability for sub-0.3k1 chromeless phase lithography (CPL) technology by Hsu, Stephen; Van Den Broeke, Douglas J.; Shi, Xuelong; Chen, J. Fung; Knose, William T.; Corcoran, Noel P.; Vedula, Srinivas; MacNaughton, Craig W.; Richie, Michael; Kawahira, Hiroichi is a scholarly article available to read on EtoBox.

Author

Hsu, Stephen; Van Den Broeke, Douglas J.; Shi, Xuelong; Chen, J. Fung; Knose, William T.; Corcoran, Noel P.; Vedula, Srinivas; MacNaughton, Craig W.; Richie, Michael; Kawahira, Hiroichi

Publisher

SPIE

Published

2002

Language

EN