About this scholarly article

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Advances in Patterning Materials and Processes XXXIV - Investigation on spin-on hard mask integration by Hohle, Christoph K.; Gronheid, Roel; Park, Yushin; Shin, Seungwook; Kim, Yunjun; Kim, Seunghyun; Lim, Jaebum; Kim, Sung Hwan; Jung, Hyeonil; Lee, Chungheon; Han, Miyeon; Lim, Sanghak; Yu, Jeong Yun is a scholarly article available to read on EtoBox.

Author

Hohle, Christoph K.; Gronheid, Roel; Park, Yushin; Shin, Seungwook; Kim, Yunjun; Kim, Seunghyun; Lim, Jaebum; Kim, Sung Hwan; Jung, Hyeonil; Lee, Chungheon; Han, Miyeon; Lim, Sanghak; Yu, Jeong Yun

Publisher

SPIE

Published

2017

Language

EN