About this scholarly article

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XI - Yokohama, Japan (Wednesday 14 April 2004)] Photomask and Next-Generation Lithography Mask Technology XI - Model-based interpretation filtering for complex two-dimensional layout features by Melvin III, Lawrence S.; Tanabe, Hiroyoshi; Shiely, James P.; Cork, Christopher M.; Rieger, Michael L. is a scholarly article available to read on EtoBox.

Author

Melvin III, Lawrence S.; Tanabe, Hiroyoshi; Shiely, James P.; Cork, Christopher M.; Rieger, Michael L.

Publisher

SPIE

Published

2004

Language

EN