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About this Physics and Astronomy article
AIP Conference Proceedings - Role of the Ultrathin Silicon Oxide Interfacial Layer in High-k Dielectrics Properties by Novkovski, Nenad is a Physics and Astronomy article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Physics and Astronomy.
- Author
- Novkovski, Nenad
- Publisher
- AIP
- Published
- 2007
- Language
- EN
- Field
- Physics and Astronomy (Physical Sciences)