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About this Physics and Astronomy article

AIP Conference Proceedings - Role of the Ultrathin Silicon Oxide Interfacial Layer in High-k Dielectrics Properties by Novkovski, Nenad is a Physics and Astronomy article available to read on EtoBox.

It is typically read by researchers, students, and practitioners in Physics and Astronomy.

Author
Novkovski, Nenad
Publisher
AIP
Published
2007
Language
EN
Field
Physics and Astronomy (Physical Sciences)

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