About this scholarly article

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Metrology, Inspection, and Process Control for Microlithography XIII - Data analysis for photolithography by Mack, Chris A.; Jug, Sven; Legband, Dale A.; Singh, Bhanwar is a scholarly article available to read on EtoBox.

Author

Mack, Chris A.; Jug, Sven; Legband, Dale A.; Singh, Bhanwar

Publisher

SPIE

Published

1999