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About this Engineering article
Raman characterization of Ge distribution in individual Si[sub 1−x]Ge[sub x] alloy nanowires by Nishimura, Chiharu; Imamura, Go; Fujii, Minoru; Kawashima, Takahiro; Saitoh, Tohru; Hayashi, Shinji is a Engineering article available to read on EtoBox.
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- Author
- Nishimura, Chiharu; Imamura, Go; Fujii, Minoru; Kawashima, Takahiro; Saitoh, Tohru; Hayashi, Shinji
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 0003-6951)
- Published
- 2008
- Language
- EN
- Field
- Engineering (Physical Sciences)