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Modeling the effect of charges in the back side passivation layer on through silicon via (TSV) capacitance after wafer thinning by Rack, M. ;Stucchi, M. ;Sun, X. ;Neve, C. Roda ;Van der Plas, G. ;Beyne, E. ;Absil, P. ;Raskin, J.-P. is a scholarly article available to read on EtoBox.

Author
Rack, M. ;Stucchi, M. ;Sun, X. ;Neve, C. Roda ;Van der Plas, G. ;Beyne, E. ;Absil, P. ;Raskin, J.-P.
Publisher
IEEE
Published
2015
Language
EN

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