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About this Physics and Astronomy article
Effect of plasma oxidation parameters on physical properties of nanocrystalline nickel oxide thin films grown by two-step method: DC sputtering and plasma oxidation by Hajakbari, F.; Rashvand, S.; Hojabri, A. is a Physics and Astronomy article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Physics and Astronomy.
- Author
- Hajakbari, F.; Rashvand, S.; Hojabri, A.
- Publisher
- Springer-Verlag; Springer Open; Springer Science and Business Media LLC (ISSN 2251-7235)
- Published
- 2019
- Field
- Physics and Astronomy (Physical Sciences)