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About this Engineering article
A High-activity Nitrogen Plasma Flow Source for Deposition of Silicon Nitride Films by Shi, D.Q.; Xu, W.; Miao, C.Y.; Ma, C.Y.; Ren, C.S.; Lu, W.Q.; Zhang, Q.Y. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Shi, D.Q.; Xu, W.; Miao, C.Y.; Ma, C.Y.; Ren, C.S.; Lu, W.Q.; Zhang, Q.Y.
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0257-8972)
- Published
- 2016
- Language
- EN
- Field
- Engineering (Physical Sciences)
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