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About this Engineering article
Reaching the Theoretical Resonance Quality Factor Limit in Coaxial Plasmonic Nanoresonators Fabricated by Helium Ion Lithography by Melli, M.; Polyakov, A.; Gargas, D.; Huynh, C.; Scipioni, L.; Bao, W.; Ogletree, D. F.; Schuck, P. J.; Cabrini, S.; Weber-Bargioni, A. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Melli, M.; Polyakov, A.; Gargas, D.; Huynh, C.; Scipioni, L.; Bao, W.; Ogletree, D. F.; Schuck, P. J.; Cabrini, S.; Weber-Bargioni, A.
- Publisher
- American Chemical Society; American Chemical Society (ACS) (ISSN 1530-6984)
- Published
- 2013
- Language
- EN
- Field
- Engineering (Physical Sciences)