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Can I read Improved Analysis of Low Frequency Noise in Polycrystalline Silicon Thin-film Transistors on EtoBox?
Improved Analysis of Low Frequency Noise in Polycrystalline Silicon Thin-film Transistors by D.H. Tassis; N.A. Hastas; C.A. Dimitriadis; G. Kamarinos is a Engineering article available to read on EtoBox.
What is Improved Analysis of Low Frequency Noise in Polycrystalline Silicon Thin-film Transistors about?
An improved analysis of the low frequency noise in polycrystalline silicon thin-film transistors (polysilicon TFTs) is presented. The analysis takes into account an exponential energy distribution for the density of states and the flat-band voltage fluctuations for the origin of the drain current noise. Analysis of the drain current spectral density enables the characterization of the gate oxide/ polysilicon interface and the active polysilicon layer quality.
Who reads Improved Analysis of Low Frequency Noise in Polycrystalline Silicon Thin-film Transistors?
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- D.H. Tassis; N.A. Hastas; C.A. Dimitriadis; G. Kamarinos
- Publisher
- Elsevier Science; Elsevier ; Elsevier Ltd.; Elsevier BV (ISSN 0038-1101)
- Published
- 2005
- Language
- EN
- Field
- Engineering (Physical Sciences)
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