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Vol. A. ch. 1. Structural aspects. Structural heterogeneities in device-quality amorphous hydrogenated semiconductors / Jeffrey A. Reimer and Mark A Petrich -- Local structure of dopants in hydrogenated amorphous silicon / J.B. Boyce and S.E. Ready -- Heterogeneities in [alpha]-SiGe:H Alloys / William Paul -- Microporesin [alpha]-Si:H / P. Danesh and B. Pantchev -- Structure of amorphous semiconductors from small angle scattering / R. Bellissent -- Plasma deposition of amorphous and crystalline silicon : the effect of hydrogen on the growth, structure and electronic properties / Chuang Chuang Tsai -- Thermodynamic and kinetic properties of amorphous silicon formed by ion implantation / J.M. Poate -- ch 2. Defects and defect dynamics. Thermal equilibrium effects in doped hydrogenated amorphous silicon / James Kakalios and Robert A Street -- The hydrogen glass model / James Kakalios and Warren B. Jackson -- Kinetics of Carrier-Induced Metastable Defect Formation in Hydrogenated Amorphous Silicon / Warren B. Jackson and James Kakalios / Energy and Density of Gap States in [alpha]-Si:H -- J. Kočdka, M. Vaněčk and A. Tríska -- Surface and bulk states determined by photothermal defle

Author

Fritzsche, Hellmut

Publisher

World Scientific Publishing Company

Published

1989

Language

EN

ISBN

9789971506193