About this Materials Science article
Dynamic MC simulation for a-C:H deposition in methane plasma based on subplantation model by Miyagawa, Y.; Nakadate, H.; Ikeyama, M.; Nakao, S.; Miyagawa, S. is a Materials Science article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- Miyagawa, Y.; Nakadate, H.; Ikeyama, M.; Nakao, S.; Miyagawa, S.
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0925-9635)
- Published
- 2003
- Language
- EN
- Field
- Materials Science (Physical Sciences)