About this scholarly article

SPIE Proceedings [SPIE NanoScience + Engineering - San Diego, California, USA (Sunday 10 August 2008)] Instrumentation, Metrology, and Standards for Nanomanufacturing II - Accuracy considerations for critical dimension semiconductor metrology by Orji, N. G.; Postek, Michael T.; Allgair, John A.; Dixson, R. G.; Bunday, B. D.; Allgair, J. A. is a scholarly article available to read on EtoBox.

Author

Orji, N. G.; Postek, Michael T.; Allgair, John A.; Dixson, R. G.; Bunday, B. D.; Allgair, J. A.

Publisher

SPIE

Published

2008