Skip to content

Opening book details…

About this Engineering article

1178. Current and breakdown characteristics of amorphous SIO2 in metal-oxide-semiconductor structure: A Plenier and B K Chakraverty, International Conf Phys Chem Semiconductors Heterojunctions Layer Structure, Vol 4, Akademiai Kiado Budapest 1971, 161–170 is a Engineering article available to read on EtoBox.

It is typically read by researchers, students, and practitioners in Engineering.

Publisher
Elsevier Science; Elsevier ; Elsevier Ltd.; Elsevier BV (ISSN 0042-207X)
Published
1972
Language
EN
Field
Engineering (Physical Sciences)