About this scholarly article

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Optical/Laser Microlithography VII - Attenuated phase-shifting mask with a single-layer absorptive shifter of CrO, CrON, MoSiO, and MoSiON film by Nakajima, Masayuki; Yoshioka, Nobuyuki; Miyazaki, Junji; Kusunose, Haruhiko; Hosono, Kunihiro; Morimoto, Hiroaki; Wakamiya, Wataru; Murayama, Keiichi; Watakabe, Yaichiro; Tsukamoto, Katsuhiro; Brunner, Timothy A. is a scholarly article available to read on EtoBox.

Author

Nakajima, Masayuki; Yoshioka, Nobuyuki; Miyazaki, Junji; Kusunose, Haruhiko; Hosono, Kunihiro; Morimoto, Hiroaki; Wakamiya, Wataru; Murayama, Keiichi; Watakabe, Yaichiro; Tsukamoto, Katsuhiro; Brunner, Timothy A.

Publisher

SPIE

Published

1994

Language

EN