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About this Engineering article
Copper Diffusion in Amorphous Thin Films of 4% Phosphorus-silcate Glass and Hydrogenated Silicon Nitride by Gupta, D.; Vieregge, K.; Srikrishnan, K. V. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Gupta, D.; Vieregge, K.; Srikrishnan, K. V.
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 0003-6951)
- Published
- 1992
- Language
- EN
- Field
- Engineering (Physical Sciences)
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