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What is Layout Decomposition For Triple Patterning Lithography about?

This paper presents a systematic study on the NP-hard problem of layout decomposition for triple patterning lithography (TPLD), which is essential for minimizing conflicts and stitches in semiconductor manufacturing at the 14-nm technology node. The authors propose graph division techniques and develop integer linear programming (ILP) and semidefinite programming (SDP) algorithms to effectively tackle the challenges of TPLD. Experimental results demonstrate that the proposed methods significantly reduce run

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qq244530537
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