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About this Engineering article
High quality Ge epitaxial layers in narrow channels on Si (001) substrates by G. Wang; E. Rosseel; R. Loo; P. Favia; H. Bender; M. Caymax; M. M. Heyns; W. Vandervorst is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- G. Wang; E. Rosseel; R. Loo; P. Favia; H. Bender; M. Caymax; M. M. Heyns; W. Vandervorst
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 0003-6951)
- Published
- 2010
- Language
- EN
- Field
- Engineering (Physical Sciences)