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About this Engineering article
Application of a thin-resist process for KrF imaging to 130 nm device fabrication by T. Azuma; K. Chiba; D. Kawamura; S. Miyoshi; T. Ozaki; H. Kageyama is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- T. Azuma; K. Chiba; D. Kawamura; S. Miyoshi; T. Ozaki; H. Kageyama
- Publisher
- AVS (American Vacuum Society); American Vacuum Society; American Institute of Physics (ISSN 0734-211X)
- Published
- 1999
- Language
- EN
- Field
- Engineering (Physical Sciences)
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