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About this Materials Science article
Optical Performance of Extreme Ultraviolet Lithography Mask with an Indium Tin Oxide Absorber by Kang, Hee Young (author);Park, Sungjin (author);Hwangbo, Chang Kwon (author);Seo, Hwan Seok (author);Kim, Seong Su (author);Cho, Han Ku (author) is a Materials Science article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- Kang, Hee Young (author);Park, Sungjin (author);Hwangbo, Chang Kwon (author);Seo, Hwan Seok (author);Kim, Seong Su (author);Cho, Han Ku (author)
- Publisher
- American Scientific Publishers (ISSN 1533-4880)
- Published
- 2012
- Language
- EN
- Field
- Materials Science (Physical Sciences)