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About this Engineering article
405 nm Laser Thermal Lithography of 40 nm Pattern Using Super Resolution Organic Resist Material by Usami, Yoshihisa; Watanabe, Tetsuya; Kanazawa, Yoshinori; Taga, Kazuaki; Kawai, Hiroshi; Ichikawa, Kimio is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Usami, Yoshihisa; Watanabe, Tetsuya; Kanazawa, Yoshinori; Taga, Kazuaki; Kawai, Hiroshi; Ichikawa, Kimio
- Publisher
- Institute of Pure and Applied Physics; Japan Society of Applied Physics; Japan Soc of Applied Physics; IOP Publishing (ISSN 1882-0778)
- Published
- 2009
- Language
- EN
- Field
- Engineering (Physical Sciences)