About this scholarly article

SPIE Proceedings [SPIE International Symposium on Optical Science and Technology - San Diego, CA (Sunday 29 July 2001)] Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries II - How to measure sub-ppm optical homogeneity in fused silica: impact of temperature on accuracy and reproducibility by Schoenfeld, Doerte; Kuehn, Bodo; Steinert, Armin; Takke, Ralf; Duparre, Angela; Singh, Bhanwar is a scholarly article available to read on EtoBox.

Author

Schoenfeld, Doerte; Kuehn, Bodo; Steinert, Armin; Takke, Ralf; Duparre, Angela; Singh, Bhanwar

Publisher

SPIE

Published

2001