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About this Engineering article
Process and device performance of submicrometer-channel CMOS devices using deep-trench isolation and self-aligned TiSi2technologies by Yamaguchi, T.; Morimoto, S.; Hee Kyun Park; Eiden, G.C. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Yamaguchi, T.; Morimoto, S.; Hee Kyun Park; Eiden, G.C.
- Publisher
- IEEE; Institute of Electrical and Electronics Engineers; Institute of Electrical and Electronics Engineers (IEEE) (ISSN 0018-9383)
- Published
- 1985
- Field
- Engineering (Physical Sciences)
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