About this scholarly article

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Etched-multilayer black border formed on EUV mask: Does it cause image degradation during pattern inspection using EB optics? by Panning, Eric M.; Goldberg, Kenneth A.; Amano, Tsuyoshi; Iida, Susumu; Hirano, Ryoichi; Abe, Tsukasa; Morikawa, Yasutaka; Watanabe, Hidehiro is a scholarly article available to read on EtoBox.

Author

Panning, Eric M.; Goldberg, Kenneth A.; Amano, Tsuyoshi; Iida, Susumu; Hirano, Ryoichi; Abe, Tsukasa; Morikawa, Yasutaka; Watanabe, Hidehiro

Publisher

SPIE

Published

2016