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About this Engineering article
Redistribution of Dopants in Ion-implanted Silicon by Pulsed-laser Annealing by White, C. W.; Christie, W. H.; Appleton, B. R.; Wilson, S. R.; Pronko, P. P.; Magee, C. W. is a Engineering article available to read on EtoBox.
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- Author
- White, C. W.; Christie, W. H.; Appleton, B. R.; Wilson, S. R.; Pronko, P. P.; Magee, C. W.
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 0003-6951)
- Published
- 1978
- Language
- EN
- Field
- Engineering (Physical Sciences)